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<
azonenberg>
NullMoogleCable: chemical-mechanical polishing
<
azonenberg>
i've mostly used it at the die level for deprocessing
<
azonenberg>
i have not yet tried to CMP a whole wafer but it's done routinely by fabs
<
Sync__>
it is easy enough
<
azonenberg>
Sync__: the hard part is getting everything super-uniform
<
azonenberg>
But in this case, if you just want to strip a film
<
azonenberg>
and you dont care about the wafer being slightly higher on one side than the other
<
azonenberg>
then its a lot easier
<
Sync__>
well, as everything it is fiddly to set up
<
Sync__>
it apparently is really tricky to get wafers with two polished surfaces
<
Sync__>
if you don't care about braking your wafers you can just determine the preferred way of breaking them to know which orientation they are
<
NullMoogleCable>
and it looks expired too
<
Sync__>
nobody will care if you do that
<
Sync__>
I wonder what they used it for, if at all
<
NullMoogleCable>
to oxidize silicon without a 1200* oven...
<
Sync__>
the problem is the wafer will have serious ionic contamination
<
NullMoogleCable>
how so?
<
Sync__>
the electrolyte contains sodium
<
NullMoogleCable>
what would be the effects of said contamination?
<
Sync__>
bad lifetime, meaning slow transistors
<
Sync__>
I'd just shove them through rto
<
NullMoogleCable>
rto?
<
Sync__>
rapid thermal oxidation
<
NullMoogleCable>
I dont have a oven... yet
<
Sync__>
just get a small glazing oven
<
NullMoogleCable>
how much do thoes run?
<
Sync__>
new I guess around 300, used probably around 50-100
<
azonenberg>
sodium? run away
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