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azonenberg>
nmz787: isotropic etches for silicon?
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azonenberg>
your options are, basically
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azonenberg>
HF + strong oxidizer
<
azonenberg>
or SF6 plasma
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nmz787>
azonenberg: someone on mems-list said DRIE without side-wall passivation, same thing as SF6 plasma?
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azonenberg>
nmz787: DRIE is normally alternating steps of SF6 plasma and some kind of fluorine-based passivation
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azonenberg>
i forget what the base is but it ends up being essentially PECVD teflon
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nmz787>
what's easiest?
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nmz787>
is DRIE cheap?
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nmz787>
i wouldn't need much, i think, 1 micron deep to start
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nmz787>
this local lab would let me use their lab for $20/hr, spin coater, fume hood, solvent cabinet and address for delivery, already have HF
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nmz787>
they also have a FIB, but that's another pricing scheme that is a bit blurry
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nmz787>
(not sure if any of their chems are still 'good') or if they go bad
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Sync__>
doing DRIE at home is not the cheapest thing to do
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lkcl_>
kanzure: :)
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nmz787>
no i wouldn't do either at home
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kanzure>
lkcl_: sup
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