<Noxz>
though given I may be using it for chemistry, there's one or two on that list that sort of jump out at me
<Noxz>
but yeah, seems like anything would actually work
<sync>
yeah, especially if you use it for chemistry I'd be running the cheapest oil there is and just change it often
<Noxz>
ah
<Noxz>
I do plan on backing it with a diaphragm
<Noxz>
after enough reading
<Noxz>
which will essentially remove many condensates
<sync>
do whatever you want
<Noxz>
mist filter wanted/needed, as well
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<berndj>
why is boron used as P-type dopant in silicon and not aluminium?
<Noxz>
boron is easier to have in solution??
<Noxz>
just a guess
<Noxz>
per wiki: Boron is the p-type dopant of choice for silicon integrated circuit production because it diffuses at a rate that makes junction depths easily controllable. Phosphorus is typically used for bulk-doping of silicon wafers, while arsenic is used to diffuse junctions, because it diffuses more slowly than phosphorus and is thus more controllable.
<sync>
berndj: because of aluminium spikes berndj
<sync>
but in theory you can use Al
<sync>
but I think it is also an issue of diffusion speed and atom size
<berndj>
is it radically different in size than silicon? it's in the same period after all
<sync>
125 vs 110 pm
<sync>
boron is 85pm
<sync>
so it would put it into compression instead of tension